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Samsung Chemical Begins Mass Production of CNT Pelicles for Next-Generation Lithography Equipment - Intensified Competition in Japan's Semiconductor Industry
- Writing language: Korean
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Base country: Japan
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Summarized by durumis AI
- Samsung Chemical is establishing a production facility for carbon nanotube (CNT) pellicles with an annual production capacity of 5,000 units at its Iwakuni Otaki plant in Japan, scheduled to be completed in December 2025.
- CNT pellicles protect photomasks in semiconductor manufacturing processes, preventing scratches and dust-related production decline. They are particularly suitable for extreme ultraviolet (EUV) lithography technology, essential for advanced semiconductor manufacturing.
- This production decision is in response to the increasing demand for advanced semiconductors and the expanding adoption of EUV lithography technology for creating finer circuit patterns, signaling intensified competition in Japan's semiconductor industry.
Samsung Chemical announced that it will mass-produce carbon nanotube (CNT) pellicles for use in next-generation lithography equipment for semiconductor manufacturing. This mass production will be carried out by installing production facilities at its Iwakuni Otaki Plant (Waki-cho, Yamaguchi Prefecture) in Japan, which is scheduled to be completed in December 2025. The annual production capacity is expected to be 5,000 sheets, with the investment amount not disclosed.
Samsung Chemical's CNT pellicle mass production is aimed at responding to the growing demand for advanced semiconductors. Pellicles are thin protective films attached to the surface of photomasks (semiconductor circuit base plates) to prevent scratches and dust from adhering, thereby improving the productivity of the exposure process.
Recently, as the use of artificial intelligence (AI) accelerates, semiconductors that handle data processing are demanding high-speed processing capabilities and low power consumption. To meet these demands, ultra-fine patterning of circuit lines is essential, and the adoption of extreme ultraviolet (EUV) lithography technology for forming fine-patterned circuits is being expanded in earnest.
Samsung Chemical plans to respond to this demand by commercializing CNT pellicles that have high transmittance and light resistance suitable for the EUV exposure environment. This mass production decision is expected to further intensify competition in the semiconductor industry within Japan.
